DLC Coating Equipment Product List and Ranking from 4 Manufacturers, Suppliers and Companies

DLC (Diamond-Like Carbon) Coating Equipment

DLC coating equipment that enables various modifications of DLC films! Capable of handling everything from small quantities of diverse products like ultra-precision molds and high-speed sliding parts to large-scale production!

Based on the formation of DLC films with low friction coefficients and high hardness, we enable various modifications of DLC films to accommodate a wide range of applications. From small-batch, diverse products such as ultra-precision molds and high-speed sliding components to large-scale production, we have numerous achievements as a research and development machine. 【Product Lineup】 ■NANOCOAT Series: Single-layer DLC film deposition equipment ■DASH Series: Multi-layer DLC film deposition equipment ■NPS Series: PS2 system standard deposition equipment *For details, please request materials or view the PDF data available for download.

Company：ナノテック
Price：Other

Other processing machines

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A technical booklet that easily explains the basics of DLC coating.

This is a small booklet that can be easily understood just by reading the basics of the DLC (Diamond-Like Carbon), which is currently being distributed for free.

**Overview** DLC films are formed by decomposing hydrocarbon gas in an arc discharge plasma under high vacuum, and by electrically accelerating ions and excited molecules in the plasma towards the substrate (product) with energy. Additionally, due to the dense amorphous structure of the DLC film, its surface is very smooth and free of crystal grain boundaries. This surface characteristic contributes to the excellent tribological (friction and wear) properties of DLC. For more details, please contact us or download the catalog.

Company：ナノテック
Price：Other

Processing Contract

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PIG-type DLC coating device

Achieves excellent membrane adhesion and high surface pressure resistance! Equipped with a standard sputter cathode!

The "PIG-type DLC Film Formation Device" utilizes a uniquely developed PIG plasma gun, enabling the high-speed formation of extremely smooth and low-adhesive DLC films through a high-density plasma CVD system. It comes standard with a sputter cathode, achieving excellent film adhesion and high surface pressure resistance through a laminated structure with sputter films. With a wealth of experience in surface treatment applications for automotive parts, it has been adopted in many applications. Additionally, by equipping a newly developed arc discharge magnetron cathode, it is capable of forming hard films via PVD, making it easy to expand functionality into a plasma CVD + PVD composite film formation device. For those interested in evaluation, we offer sample testing. For more details on specifications and film quality, please feel free to contact us. 【Features】 ■ Extremely smooth DLC films can be formed: (Ra = 0.015μm or less) ■ Fast film formation rate: (3μm/hr or more) ■ Low-temperature film formation: (200℃ or less) ■ Thick film formation possible: (20μm) ■ DLC film removal: DLC removal can be performed within the same vacuum chamber. *For more details, please refer to the PDF document or feel free to contact us.

Company：神港精機東京支店
Price：Other

Other physicochemical equipment
Other machine tools
Plasma surface treatment equipment

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DLC coating device for infrared reflection prevention film

A DLC film with high infrared transmittance is formed on both sides of the substrate at a high rate. Achieving next-generation IR coating with stable hard and advanced soft materials.

Expanding the PIG-type DLC film formation device, which has a proven track record in hard films and surface treatment applications, for infrared optical applications. A DLC film with over 90% high transmittance is formed uniformly on both sides of the substrate, achieving hard, high-transmittance DLC films with high productivity.

Company：神港精機東京支店
Price：Other

Plasma surface treatment equipment
Plasma Generator
CVD Equipment

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DLC coating equipment

Extensive control over membrane properties! You can choose between water-cooled and heated substrate heating sources.

The "DLC Coating Device" has a wealth of accumulated data, achieving excellent film thickness distribution and reproducibility. The film formation sources can be selected from RF plasma CVD method and ionized deposition method. It can be used for semiconductors, electronic components, optical components, automotive parts, and more. Additionally, multi-chamber specifications and various custom-made options can be produced. Please feel free to contact us when you need assistance. 【Features】 ■ Film formation sources can be selected from RF plasma CVD method and ionized deposition method ■ Substrate heating sources can be selected from water-cooled and heated types ■ Achieves excellent film thickness distribution and reproducibility ■ Capable of film formation on various substrate materials ■ Extensive control over film properties *For more details, please refer to the PDF materials or feel free to contact us.

Company：ジャパンクリエイト
Price：Other

Painting Machine

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Leben Co., Ltd. Business Introduction

Supplied to universities, research institutions, metal processing companies, semiconductor manufacturers, and automobile manufacturers!

Our company is engaged in the planning, design, and manufacturing of surface treatment equipment, as well as various surface processing OEM contract processing services. We process various parts and materials entrusted to us by your company using advanced surface treatment equipment. From the design and manufacturing of DLC coating equipment to contract processing for your products and parts, we will contribute to the quality improvement of your products using HF-DLC, DLC, and PVD, among others. Please feel free to contact us with your requests. 【Business Activities】 ■ Planning, design, and manufacturing of surface treatment equipment ■ Various surface processing OEM contract processing services *For more details, please refer to the PDF document or feel free to contact us.

Company：Leben
Price：Other

Contract manufacturing
Processing Contract

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Hydrogen-free DLC coating device (high-density sputtering ADMS device)

Forming hydrogen-free DLC films (hydrogen content below 1%) with unique technology, exhibiting excellent tribological properties in oil, and compatible with conductive carbon thin films.

Achieving a hydrogen-free DLC film (hydrogen content in the film below 1%) that is unprecedented in conventional production equipment. Utilizing a high-density plasma sputtering technology that does not use hydrogen in the film formation process, with a new type of PVD equipment (ADMS = Arc Discharge Magnetron Sputtering Device). The hydrogen-free dense DLC film reduces the sliding characteristics in Mo-added lubricants to less than 1/15 compared to conventional hydrogen-containing DLC films (from 1 to 0.06). The latest film formation process also accommodates the formation of conductive carbon thin films, expanding applications across a wide range of fields from biotechnology to new energy. The low-voltage, low-pressure plasma generated by the newly developed arc discharge magnetron cathode is applied not only for film formation but also for ion nitriding and etching of substrate surfaces, providing high-quality integrated processing from pre-treatment and substrate hardening to coating. The hydrogen-free DLC film (ADMS-CN film) produced by this device (arc discharge magnetron sputtering device) represents a new dry process that goes beyond traditional DLC (hard film formation), significantly broadening the possibilities of plasma surface treatment technology.

Company：神港精機東京支店
Price：Other

Sputtering Equipment
Other machine tools
Plasma surface treatment equipment

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